发明名称 |
Photoresist coating composition and method for forming fine pattern using the same |
摘要 |
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to all semiconductor processes.
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申请公布号 |
US7615338(B2) |
申请公布日期 |
2009.11.10 |
申请号 |
US20050298385 |
申请日期 |
2005.12.08 |
申请人 |
HYNIX SEMICONDUCTOR INC.;YOUNGCHANG CHEMICAL CO., LTD. |
发明人 |
LEE GEUN SU;MOON SEUNG CHAN;LEE SEUNG HUN |
分类号 |
G03C1/73;G03F7/26;G03F7/36 |
主分类号 |
G03C1/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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