VERTICAL HEAT TREATMENT BOAT, AND HEAT TREATMENT METHOD OF SILICON WAFER USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a vertical heat treatment boat capable of suppressing both Fe contamination transfer to the silicon wafer and surface roughening of the back face of the silicon wafer in carrying out a heat treatment using argon or the like by mounting a substrate to be treated such as a silicon wafer on the vertical heat treatment boat provided with a support auxiliary member; and a heat treatment method of a silicon wafer using the same. SOLUTION: This vertical heat treatment boat is provided with support auxiliary members which are removably mounted on respective supporting sections of a boat body and whereupon a substrate to be treated is mounted. In the vertical heat treatment boat, the support auxiliary member has a guide member mounted on the supporting section, and a plate-like substrate supporting member whereupon the substrate to be treated is mounted; the guide member has a hole formed on the upper surface; the substrate supporting member is fixed by being inserted and fitted in the hole of the guide member; the height position of the mounting surface of the substrate to be treated is higher than the height position of the upper surface of the guide member; the substrate supporting member is formed of silicon carbide or the like; and the guide member is formed of quartz or the like. COPYRIGHT: (C)2010,JPO&INPIT