发明名称 PROCESS FOR PRODUCTION OF SILICON
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process by which the production of silicon obtained by the hydrogen reduction reaction of chlorosilane is carried out safely and continuously. <P>SOLUTION: The process for production of silicon comprises steps of: [1] reacting a chlorosilane with hydrogen under heating in a reaction vessel to cause the precipitation of silicon, while discharging an exhaust gas containing a silane oligomer and a silicon micropowder; [2] transporting the exhaust gas discharged in the step [1] while keeping the temperature of the exhaust gas at 105°C or higher; [3] supplying the exhaust gas transported in the step [2] to a filter at a temperature of 105°C or higher and discharging the exhaust gas from the filter unit at a temperature of 105°C or higher to remove the silicon micropowder from the exhaust gas, thereby producing a mixed gas containing hydrogen and the silane oligomer; [4] cooling the mixed gas produced in the step [3] to separate hydrogen in the form of a gas from the mixed gas; and others. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009256143(A) 申请公布日期 2009.11.05
申请号 JP20080108203 申请日期 2008.04.17
申请人 TOKUYAMA CORP 发明人 SAKIDA MANABU;WAKAMATSU SATOSHI
分类号 C01B33/03 主分类号 C01B33/03
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