发明名称 |
INSULATED GATE THIN FILM TRANSISTOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To electronically control the gate threshold voltage of an insulated gate thin film transistor formed in a semiconductor thin film where a carrier is depleted between first and second principal planes of complete depletion-type SOI, and the like. Ž<P>SOLUTION: A carrier amount is controlled by providing a reverse conducting third semiconductor region that contacts the semiconductor thin film, and supplying a reverse conducting carrier from the semiconductor region to the semiconductor thin film or drawing a reverse conducting carrier from the semiconductor thin film to the third semiconductor region. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
申请公布号 |
JP2009260375(A) |
申请公布日期 |
2009.11.05 |
申请号 |
JP20090175370 |
申请日期 |
2009.07.28 |
申请人 |
SEIKO INSTRUMENTS INC;HAYASHI YUTAKA |
发明人 |
HAYASHI YUTAKA;HASEGAWA TAKASHI;YOSHIDA YOSHIFUMI;OSANAI JUN |
分类号 |
H01L29/786;H01L21/8238;H01L27/08;H01L27/092 |
主分类号 |
H01L29/786 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|