发明名称 INSULATED GATE THIN FILM TRANSISTOR
摘要 <P>PROBLEM TO BE SOLVED: To electronically control the gate threshold voltage of an insulated gate thin film transistor formed in a semiconductor thin film where a carrier is depleted between first and second principal planes of complete depletion-type SOI, and the like. Ž<P>SOLUTION: A carrier amount is controlled by providing a reverse conducting third semiconductor region that contacts the semiconductor thin film, and supplying a reverse conducting carrier from the semiconductor region to the semiconductor thin film or drawing a reverse conducting carrier from the semiconductor thin film to the third semiconductor region. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009260375(A) 申请公布日期 2009.11.05
申请号 JP20090175370 申请日期 2009.07.28
申请人 SEIKO INSTRUMENTS INC;HAYASHI YUTAKA 发明人 HAYASHI YUTAKA;HASEGAWA TAKASHI;YOSHIDA YOSHIFUMI;OSANAI JUN
分类号 H01L29/786;H01L21/8238;H01L27/08;H01L27/092 主分类号 H01L29/786
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