| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition in which the line edge roughness and pattern collapse are improved, and to provide a method of forming pattern therewith. <P>SOLUTION: The positive photosensitive composition contains: a resin (A) which contains a repeating unit with a lactone structure having an Ohnishi parameter of 5.0 or less and contains a repeating unit represented by general formula (I) which produces a carboxylic acid by the action of acid; and a compound (B) which produces an acid by irradiation of active light or radiation. In the general formula (I), each of R<SB>1</SB>, R<SB>2</SB>and R<SB>3</SB>independently represents a substituted or nonsubstituted alkyl group or a substituted or nonsubstituted cycloalkyl group. The R<SB>2</SB>and R<SB>3</SB>may be bonded with each other to form a ring structure. Ra represents a hydrogen atom, an alkyl group or a group of formula -CH<SB>2</SB>-O-Ra<SB>2</SB>. In the formula, Ra<SB>2</SB>represents a hydrogen atom, an alkyl group or an acyl group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
