发明名称 MANUFACTURING METHOD OF THE SAMEINVERSE STAGGERED POLY-SI TFT WITH CENTET OFF-SET
摘要 <p>PURPOSE: A method of manufacturing inverse staggered poly-Si TFT with center off-set is provided to prevent leakage current by forming the offset region in the center of active layer channel. CONSTITUTION: The buffer layer(20) is formed on the substrate(10). The gate electrode(30) of the center offset structure is formed on the buffer layer. The gate insulating layer(40) is formed on the gate electrode. The active layer(50) is formed on the gate insulating layer. The n+ amorphous silicon Ohmic contact layer(60) is evaporated on the active layer. The source / drain electrode is formed on the n+ amorphous silicon Ohmic contact layer.</p>
申请公布号 KR20090114919(A) 申请公布日期 2009.11.04
申请号 KR20080040800 申请日期 2008.04.30
申请人 UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY 发明人 JANG, JIN;OH, JAE HWAN;KANG, DONG HAN
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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