发明名称 INCREASING RELIABILITY OF COPPER-BASED METALLIZATION STRUCTURES IN A MICROSTRUCTURE DEVICE BY USING ALUMINUM NITRIDE
摘要 By forming an aluminum nitride layer (106) by a self-limiting process sequence, the interface characteristics of a copper-based metallization layer may be significantly enhanced while nevertheless maintaining the overall permittivity of the layer stack at a lower level.
申请公布号 KR20090115190(A) 申请公布日期 2009.11.04
申请号 KR20097018207 申请日期 2008.01.31
申请人 ADVANCED MICRO DEVICES, INC. 发明人 STRECK CHRISTOF;KAHLERT VOLKER
分类号 H01L21/768;H01L21/314 主分类号 H01L21/768
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