| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device for improving the treatment efficiency of plasma treatment by suppressing abnormal discharge between electrodes. <P>SOLUTION: The stage electrode 2 is formed so that a substrate W is protruded by a distance d from each outer peripheral face 2b of the stage electrode 2. In viewing the stage electrode 2 on which the substrate W is positioned, from the side of the opposite electrode 3, an electrode surface 2a of the stage electrode 2 is covered with the substrate W. A dielectric film 9 is formed on the outer peripheral face of the stage electrode 2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
