APPARATUS AND METHOD OF MEASURING A PROPERTY OF A SUBSTRATE
摘要
The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
申请公布号
WO2009129974(A1)
申请公布日期
2009.10.29
申请号
WO2009EP02857
申请日期
2009.04.20
申请人
ASML NETHERLANDS B.V.;VAN DE KERKHOF, MARCUS ADRIANUS;VAN DER SCHAAR, MAURITS;FUCHS, ANDREAS;COOGANS, MARTYN JOHN
发明人
VAN DE KERKHOF, MARCUS ADRIANUS;VAN DER SCHAAR, MAURITS;FUCHS, ANDREAS;COOGANS, MARTYN JOHN