| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measurement method of measuring imaging performance of projection optics during use (in an exposure environment) with high precision. <P>SOLUTION: The measurement method of measuring the imaging performance of the projection optics which projects a reticle pattern onto a substrate includes a measurement step of measuring the imaging performance of the projection optics, and a calculation step of calculating the imaging performance of the projection optics in a predetermined environment different from a measurement environment in which the measurement step is performed, based on information indicating a rate of change of the imaging performance of the projection optics with respect to a physical quantity which changes the imaging performance of the projection optics, a physical quantity in the measurement environment in which the measurement step is performed, a physical quantity in the predetermined environment, and the imaging performance of the projection optics measured in the measurement step. <P>COPYRIGHT: (C)2010,JPO&INPIT |
