发明名称 SUBSTRATE FOR MULTIPLE EXPOSURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate for multiple exposure which supplies an exposure substrate to a proximity exposure device exposing the exposure substrate using a plurality of exposure masks smaller in area than that of an exposure region of the exposure substrate , the exposure mask facing the exposure substrate. <P>SOLUTION: This substrate for multiple exposure supplies an exposure substrate to the proximity exposure device exposing the exposure substrate using the plurality of exposure masks smaller in area than that of the exposure region of the exposure substrate, the exposure mask facing the exposure substrate. The substrate for multiple exposure has a plurality of active regions and a plurality of inactive regions, where the dimension of each inactive region is integer multiple of the pixel pitch of the active region. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009251572(A) 申请公布日期 2009.10.29
申请号 JP20080103402 申请日期 2008.04.11
申请人 V TECHNOLOGY CO LTD 发明人 ISHII DAISUKE;ARAI TOSHINARI
分类号 G02F1/13;G03F7/20 主分类号 G02F1/13
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