| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning removing liquid for removing deposits on a resist film while suppressing variation in surface characteristics of the resist film. SOLUTION: The cleaning removing liquid is used for removing the deposits on the resist film such as a protective film etc., formed on the resist film using a material for protective film formation containing a nonpolar polymer, and contains a hydrocabon-based nonpolar solvent and a polar solvent. The cleaning removing liquid preferably contains 1 to 50% by mass of the polar solvent based on the total amount of the hydrocabon-based nonpolar solvent and polar solvent. COPYRIGHT: (C)2010,JPO&INPIT |
