发明名称 LAMINATE CONTAINING WURTZRITE CRYSTAL LAYER, AND METHOD FOR PRODUCTION THEREOF
摘要 <p>According to the present invention, a thin film made of a wurtzite structure compound is manufactured by a reactive sputtering using a metal material as a target, and a nitrogen gas or an oxygen gas as a reactive gas. By optimizing film-forming conditions when manufacturing the film, it is possible to obtain a wurtzite thin film whose polarization directions of crystal grains are aligned in a uniform direction. According to a laminate of the present invention, a first wurtzite crystalline layer made of a wurtzite crystalline structure compound is formed in advance between a substrate and a functional material layer that is a ground. Thus, it is possible to improve the crystallinity and crystalline orientation of a second wurtzite crystalline layer formed on the functional material layer.</p>
申请公布号 EP1672091(B1) 申请公布日期 2009.10.28
申请号 EP20040733100 申请日期 2004.05.14
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 AKIYAMA, MORITO;UENO, NAOHIRO;TATEYAMA, HIROSHI;KAMOHARA, TOSHIHIRO
分类号 C23C14/06;C30B23/00;H01L41/257;H01L41/316 主分类号 C23C14/06
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