发明名称 Method of manufacturing semiconductor device and method of treating electrical connection section
摘要 A method of manufacturing a semiconductor device includes: applying a paste containing acid to an electrical connection section which is electrically connected with a semiconductor substrate; removing the paste from the electrical connection section by washing the electrical connection section; and providing a conductive material to the electrical connection section.
申请公布号 US7608479(B2) 申请公布日期 2009.10.27
申请号 US20060332262 申请日期 2006.01.17
申请人 SEIKO EPSON CORPORATION 发明人 NAKAYAMA HIROHISA;SATO SHIRO;SHOJI MASANOBU;NOSAKA HITOSHI
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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