发明名称 MASK FOR VACUUM ULTRAVIOLET RAY, MANUFACTURING METHOD FOR PATTERN FORMED BODY BY VACUUM ULTRAVIOLET RAY, AND MANUFACTURING DEVICE FOR PATTERN FORMED BODY BY VACUUM ULTRAVIOLET RAY
摘要 <P>PROBLEM TO BE SOLVED: To highly sensitively manufacture a pattern formed body irradiation-treated floating-island-likely with a vacuum ultraviolet ray, using the vacuum ultraviolet ray. <P>SOLUTION: A metal mask 10 for the vacuum ultraviolet ray is used in a method of irradiation-treating a pattern forming face pattern-shape-likely with the vacuum ultraviolet ray, by arranging the metal mask on the pattern forming face of a pattern forming substrate 101, and by irradiating the pattern forming face with the vacuum ultraviolet ray, via the metal mask, in the presence of a reactive gas, has a metal mask body 1 comprising a thin metal sheet and having an opening part, a floating island portion 2 arranged inside the opening part of the metal mask body, and a bridge portion 3 for connecting the floating island portion and the metal mask body, and the bridge portion is formed to form a free space flowable with the reactive gas between the pattern forming face and the bridge portion, when arranged on the pattern forming substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009244569(A) 申请公布日期 2009.10.22
申请号 JP20080090632 申请日期 2008.03.31
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI;YAMADA JUNICHI;NAGAE MITSUTAKA;OGAWA KENICHI;HONDA HIROYUKI;MATSUOKA MASANAO
分类号 G03F1/22;G03F7/20 主分类号 G03F1/22
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