发明名称 |
RESIST POLYMER AND RESIST COMPOSITION |
摘要 |
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
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申请公布号 |
US2009263743(A1) |
申请公布日期 |
2009.10.22 |
申请号 |
US20090496232 |
申请日期 |
2009.07.01 |
申请人 |
MITSUBISHI RAYON CO., LTD. |
发明人 |
MOMOSE HIKARU;OOTAKE ATSUSHI;UEDA AKIFUMI;FUJIWARA TADAYUKI;TAKESHITA MASARU;HAYASHI RYOTARO;IWAI TAKESHI |
分类号 |
G03F7/20;C08F10/00;C08F24/00;C08F220/12;C08F220/28;C08F220/34;G03F7/004;G03F7/039 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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