发明名称 Methods and apparatus for generating high-density plasma
摘要 Methods and apparatus for generating a strongly-ionized plasma are described. An apparatus for generating a strongly-ionized plasma according to the present invention includes an anode and a cathode that is positioned adjacent to the anode to form a gap there between. An ionization source generates a weakly-ionized plasma proximate to the cathode. A power supply produces an electric field in the gap between the anode and the cathode. The electric field generates excited atoms in the weakly-ionized plasma and generates secondary electrons from the cathode. The secondary electrons ionize the excited atoms, thereby creating the strongly-ionized plasma.
申请公布号 US7604716(B2) 申请公布日期 2009.10.20
申请号 US20040897257 申请日期 2004.07.22
申请人 ZOND, INC. 发明人 CHISTYAKOV ROMAN
分类号 C23C14/35;B01J19/12;C23C14/34;C23C16/00;C23C16/452;C25B9/00;C25B13/00;H01J7/24;H01J37/32;H01J37/34 主分类号 C23C14/35
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