SHEAR-LAYER CHUCK FOR LITHOGRAPHIC APPARATUS

摘要

A lithographic apparatus is described that comprises a support structure (300) to hold an object (210). The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck (321), on which the object is supported, and an array of shear- compliant elongated elements (325) normal to the chuck and the stage (230), such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.