| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a production method of an alkenyl phenol polymer for selectively eliminating only predetermined protecting groups without inducing contamination of metal or hydrolysis in an ester moiety, and to provide an alkenyl phenol polymer produced by the production method, a positive resist composition containing the alkenyl phenol polymer and improved in sensitivity, particle defects and development defects, and a pattern forming method using the resist composition. <P>SOLUTION: The method for producing an alkenyl phenol polymer comprises eliminating predetermined protecting groups from a polymer obtained by single polymerization of a specified compound, copolymerization with a vinyl aromatic compound, copolymerization with an acrylate, or copolymerization with a methacrylate, wherein a specified compound is used as an eliminating agent. The present invention discloses an alkenyl phenol polymer produced by the above method, a positive resist composition containing the alkenyl phenol polymer, and a pattern forming method using the resist composition. <P>COPYRIGHT: (C)2010,JPO&INPIT |
