发明名称 STAGE APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 The invention provides a stage apparatus that has a fixed part (16), which has a prescribed movement surface (16a), and a first movable body, which is capable of moving along the movement surface (16a) in a plurality of directions that includes a first direction. The stage apparatus comprises: a substage (61A, 61B) that, in synchrony with the movement of the first movable body, moves in the first direction with respect to the movement surface (16a); a first measuring apparatus (67), at least part of which is provided to the substage (61 A, 61 B), that detects information related to the relative position between the substage (61 A, 6 1 B) and the movement surface (16a) in the first direction; and a second measuring apparatus (71, 72), at least part of which is provided to the substage (61A, 61B), that detects information related to the relative position between the substage (61A, 61B) and the first movable body in a second direction, which are substantially orthogonal to the first direction and follow along the movement surface (16a).
申请公布号 EP2109133(A1) 申请公布日期 2009.10.14
申请号 EP20070859953 申请日期 2007.12.21
申请人 NIKON CORPORATION 发明人 ONO, KAZUYA
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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