发明名称 Organic-metal precursor material and method of manufacturing metal thin film using the same
摘要 Provided are an organic-metal precursor material that can be readily decomposed without reacting with an oxidant, a method of manufacturing a metal thin film using the organic-metal precursor material, and a metal thin film prepared using the organic-metal precursor material. The organic-metal precursor material is an organic molecule having lone-pair electrons selected from the group consisting of ether, amine, tetrahydrofuran (THF), a phosphine group, and a phosphite group, and has a structure of covalent coordination bond.
申请公布号 US7601392(B2) 申请公布日期 2009.10.13
申请号 US20060513999 申请日期 2006.08.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE JUNG-HYUN;SEO BUM-SEOK
分类号 C07F15/00 主分类号 C07F15/00
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