| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sheet plasma film deposition system where the inclination of sheet plasma can be adjusted without narrowing the width of a repulsive magnetic field by permanent magnets. <P>SOLUTION: The sheet plasma film deposition system 1 comprises: a plasma gun 2 emitting columnar plasma P; a pair of permanent magnets 7 composed of 7A and 7B arranged in such a manner that the magnetic pole faces of N poles are confronted with the columnar plasma P sandwiched and deforming the columnar plasma P into a sheet shape; a magnetic member 8 arranged at the face confronted with the plasma P in at least either permanent magnet 7A or 7B, and also arranged unsymmetrically to the central axis T of the columnar plasma P viewed from the confronted direction (Y direction) of the pair of permanent magnets 7A and 7B; and a film deposition chamber 9 where film deposition is performed utilizing the sheet-shaped plasma P. <P>COPYRIGHT: (C)2010,JPO&INPIT |
