| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical stripper formulation for removing photoresist and the residue of etching and ashing of electronic device substrates. SOLUTION: The stripper formulation comprises deionized water, carboxylic acid, glycol, glycol ether and ammonium fluoride. A process is also disclosed for removing photoresist and the residue of etching and ashing of electronic device substrates by contacting the substrate with a formulation comprising deionized water, carboxylic acid, glycol, glycol ether and ammonium fluoride. COPYRIGHT: (C)2010,JPO&INPIT |
