发明名称 RADIATION-SENSITIVE DRY FILM, AND MICROLENS AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive dry film having excellent storage stability after a dry film is formed, from which a microlens satisfying various characteristics even at a low heating temperature is formed. <P>SOLUTION: The radiation-sensitive dry film includes: a base film; a radiation-sensitive resin composition layer layered on the base film and containing (A) an alkali-soluble polymer, (B) a polymerizable unsaturated compound, (C) a photo-polymerization initiator and (D) a compound having an oxiranyl group, an episulfide group or an oxetanyl group; and a cover film layered on the radiation-sensitive resin composition layer. The film contains, as the (A) alkali-soluble polymer, a copolymer of (a1) a polymerizable unsaturated compound having an acidic functional group and (a2) a polymerizable unsaturated compound comprising a specified compound represented by S-(tetrahydropyran-2-yl) thiomethacrylate. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009229993(A) 申请公布日期 2009.10.08
申请号 JP20080077593 申请日期 2008.03.25
申请人 JSR CORP 发明人 HAYASHI AKIHIRO;ISHIKAWA MASAYOSHI;IIDA MASAFUMI;TSUYUKI RYOTA;UEDA JIRO
分类号 G03F7/033;C08F20/10;G02B3/00;G02F1/1335;G03F7/004;G03F7/40 主分类号 G03F7/033
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