| 摘要 |
In an upper waveguide structure (14), a width (W1) of the upper portion is larger than a width (W2) of the lower portion. The upper waveguide structure (14) has a side face (14a) which obliquely extends from an edge portion (14b) of the upper face to an edge portion (14c) of the lower face to come close to a normal (PA1) passing through the center of a light receiving surface (2a) of a photoelectric conversion unit (2). A gap (11) in the air gap structure (AG1) is formed by etching a first insulating layer (4a l: see FIG. 4A) serving as a first interlayer dielectric film (4a) so as to expose not an inner region (2a1) but an outer region (2a2) on the light receiving surface (2a) of the photoelectric conversion unit (2).
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