DOUBLE-SIDE COATING APPARATUS, METHOD FOR COATING DOUBLE SIDES WITH COATING SOLUTION, EDGE RINSE APPARATUS AND EDGE RISE METHOD

摘要

Provided is a double-side coating apparatus which can uniformly coat the both surfaces of a substrate to be processed with a coating solution and form uniform coat films on the both surfaces of the substrate to be processed. A double-side coating apparatus (1) is provided with a holding mechanism (3a) which holds a substrate (2) to be processed such that the thickness direction of the substrate (2) is in the horizontal direction; a rotation drive mechanism for rotating the substrate (2) in a circumferential direction; a first coating solution nozzle (18a) for jetting the coating solution onto one main surface (2a) of the substrate (2); and a second coating solution nozzle for jetting the coating solution onto the other main surface (2b) of the substrate (2). The first coating solution nozzle (18a) and the second coating solution nozzle are symmetrically arranged with respect to a thickness center surface of the substrate (2). An edge rinse apparatus which can accurately and stably rinse only a fixed width of an outer peripheral portion of the substrate and can easily control the width of the outer peripheral portion to be rinsed even the width of the outer peripheral portion to be rinsed is small.