| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus and method for inspecting irregularity of a periodic pattern that accurately images and detects the irregularity caused by dimension shift and position shift of several nm order in the periodic pattern, especially in an inspecting object such as a photo-mask for a CCD/CMOS imager where the directivity of the cell pitch or pattern varies. <P>SOLUTION: This apparatus for inspecting irregularity includes an illumination section 10, an X-Y-θstage section 20 where positioning operation of a substrate 60 to be inspected and scanning operation during inspection and imaging are allowed, an imaging section 30 for alignment for positioning the substrate 60 to be inspected, an inspection/imaging section 40 for imaging the inspection image of the substrate 60 to be inspected, and a processing-control section 100 that receives operation control and video output of the whole device as image information, performs image arithmetic processing, supplies and receives the image information and inspection information, and further includes a function of displaying an image. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
