发明名称 Imprint mold structure and imprint method using the same, and method for manufacturing magnetic recording medium
摘要 Provided is an imprint mold structure containing: a substrate; and a concave-convex portion formed by arranging on one surface of the substrate convex portions with reference to the surface, the imprint mold structure being used for an imprint method containing a transferring step and a curing step, wherein the imprint mold structure satisfies the following formula 1: HBR < HMS < HAR where HMS is a hardness of an outermost surface on the transfer side of the imprint mold structure, HBR is a hardness of the imprint resist layer in the transferring, HAR is a hardness of the imprint resist layer after the curing, and HMS is 1 GPa or less.
申请公布号 EP2105920(A1) 申请公布日期 2009.09.30
申请号 EP20090004171 申请日期 2009.03.24
申请人 FUJIFILM CORPORATION 发明人 NISHIKAWA, MASAKAZU
分类号 G11B5/855;B29C33/38;B29C33/42 主分类号 G11B5/855
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