| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist stripper composition applicable to a substrate containing silver and/or silver alloy. <P>SOLUTION: The photoresist stripper composition for the substrate containing silver and/or silver alloy contains one or more selected from a group consisting of compounds expressed by formula (I): NH<SB>2</SB>-A-Y-B-Z, formula (II): NH<SB>2</SB>-A-N(-B-OH)<SB>2</SB>, morpholine, N-substituted morpholine, pyrocatechol, hydroquinone, pyrogallol, gallic acid, and gallic acid esters, and one or more polar organic solvents. In the formula (I), A and B independently represents a straight-chain or branched-chain 1 to 5C alkylene group; Y represents NH or O; Z represents NH<SB>2</SB>, OH, or NH-D-NH<SB>2</SB>, wherein D represents a straight-chain or branched-chain 1-5C alkylene group. In the formula (II), A and B are the same as in the formula (I). <P>COPYRIGHT: (C)2009,JPO&INPIT |
