| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a pattern medium using an imprint method capable of preventing a resist pattern defect generated by gas taken between an interface of an imprinting mold and a resist layer and a resist pattern defect generated by a bubble probably generated in the resist film and on the resist surface. SOLUTION: In the manufacturing method of the magnetic recording medium using the imprint method for pattern formation, as the preprocessing of an imprint process, an exposure process is performed for exposing a substrate having the resist film formed on the surface thereof to an atmosphere of a temperature higher than a temperature upon imprint and environmental pressure lower than environmental pressure upon imprint. COPYRIGHT: (C)2009,JPO&INPIT
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