发明名称 METHOD AND APPARATUS FOR DETECTING NON-UNIFORM FRACTURING OF A PHOTOMASK SHAPE
摘要 One embodiment of the present invention provides a system that detects an occurrence of a given shape which has been fractured into a configuration of primitive shapes which is different from a desired configuration. The system selects a fractured-shape instantiation of the given shape, to which other fractured-shape instantiations for the given shape are compared. As a part of the comparison process, the system generates a filtered mask-pattern-description which includes primitive shapes in the mask-pattern-description that match at least one primitive shape in the selected fractured-shape instantiation. Next, the system identifies a first set of shape occurrences from the filtered mask-pattern-description which match the given shape, and identifies a second set of shape occurrences from the mask-pattern-description which match the given shape. The system then generates a third set of shape occurrences by performing an exclusive-OR comparison between the first and second sets of shape occurrences.
申请公布号 US2009238467(A1) 申请公布日期 2009.09.24
申请号 US20080257983 申请日期 2008.10.24
申请人 SYNOPSYS, INC. 发明人 YEAP CHEE PENG;NOGATCH JOHN T.
分类号 G06K9/46 主分类号 G06K9/46
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