| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device reduced in an obliquely-entering component entering a photoelectric conversion region, and suppressed in degradation of an image due to the occurrence of smear, and to provide manufacturing method of the same. SOLUTION: This solid-state imaging device is provided with: a semiconductor substrate 1 with photoelectric conversion regions 2 formed thereon; first microlenses 9 formed above the semiconductor substrate 1 to cover the photoelectric conversion regions 2, condensing external light on the photoelectric conversion regions 2 and having a convex upper surface; and second microlenses 13a formed above the first microlenses 9, condensing the external light on the first microlenses 9 and having a convex upper surface. Flat surfaces 16 are formed in regions being top parts of one side of the first microlenses 9 and the second microlenses 13a, and located directly above the photoelectric conversion regions 2. COPYRIGHT: (C)2009,JPO&INPIT
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