| 摘要 |
A film depositing apparatus comprises: a chamber; a rotatable cylindrical drum that is provided within the chamber, and around which a substrate is wrapped in a specified surface region; a film depositing electrode spaced apart from and in a face-to-face relationship with a surface of the drum, and a feed gas supply section from which a feed gas for forming a film is supplied into a gap between the drum and the film depositing electrode; and a gas-flow regulating unit that regulates the feed gas as supplied into the gap between the drum and the film depositing electrode during film formation to be easier to flow in a direction in which the drum rotates than in a direction along which the axis of rotation of the drum extends.
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