| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method, an apparatus, and the like, which form an alignment mark precise and good in quality on a substrate. <P>SOLUTION: An embodiment relates to a method for forming a set of alignment marks on a substrate. The method includes exposing a first pattern of an element in an element size on a layer of a substrate and exposing a second pattern of an element in a different element size on the first pattern. The element of the first pattern and the element of the second pattern superimpose each other, to form the set of the alignment marks, the periphery of which is formed by small elements. An embodiment shows a lithographic apparatus composed so as to form a set of such alignment marks. An embodiment shows a method for comparing lithographic apparatuses, to take into account of deformation relating to heat. <P>COPYRIGHT: (C)2009,JPO&INPIT |
