| 摘要 |
There is provided a post exposure baking apparatus that can effectively restrain the fluctuation of the size of pattern between wafers in a baking process for continuously processing a plurality of wafers as a batch sequence and a control method thereof. A baking time offset amount is set for each order number processing each wafer in the batch sequence, and a baking time of the wafer is corrected in accordance with the baking time offset amount corresponding to the processing order number in the baking process of the wafer.
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