FABRICATION METHOD OF ARRAYED X-RAY SOURCE

摘要

A method for manufacturing an arrayed X-ray source is provided to form a single mode by maintaining a mode of an X-ray beam formed in an inner part. A substrate(40) is cleaned by acetone and distilled water. The substrate is mounted in a sputtering apparatus. An argon gas is injected in a vacuum chamber of an ultra-high vacuum state. A tungsten thin film(20) is deposited by thickness of 200nm, and forms a buffer layer. An etching layer is deposited. The etching layer is determined according to a design of a multilayered thin film in order to determine thickness of an X-ray core. The tungsten thin film is deposited on a top end of the etching layer. A sample is separated from the vacuum chamber. A polymer is coated on a surface of the deposited surface. A polymer layer is solidified. The polymer layer(50) is cut by a fixed size. A nano channel is formed by etching the etching layer with etchant.