| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of forming a siliceous film containing a low concentration of nitrogen. <P>SOLUTION: The siliceous film forming method includes the steps of: forming a coating film by coating an irregular substrate surface with a polysilazane composition; hardening only a part of the coating film that is adjacent to the substrate surface, of the coating film, to thereby form a coating thin film running along the shape of the irregular substrate; and removing a polysilazane composition remaining unhardened during the coating thin film forming step, of the coating film. The siliceous films that are formed by this method can be plurally laminated. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
