| 发明名称 |
POLISHING SLURRIES FOR CHEMICAL-MECHANICAL POLISHING |
| 摘要 |
The aqueous slurries according to the present invention include soluble salts of molybdenum dissolved in an oxidizing agent and deionized water. Other aqueous polishing slurries include dissolved and undissolved nanoparticles of MoO3 in a solution of deionized water and an oxidizing agent.
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| 申请公布号 |
US2009224200(A1) |
申请公布日期 |
2009.09.10 |
| 申请号 |
US20090469193 |
申请日期 |
2009.05.20 |
| 申请人 |
CLIMAX ENGINEERED MATERIALS, LLC |
发明人 |
JHA SUNIL CHANDRA;NIMMALA SREEHARI;HEDGE SHARATH;HONG YOUNGKI;BABU SURYADEVARA VIJAYAKUMAR;PATRI UDAYA B. |
| 分类号 |
C09K13/00;C09G1/02;C09K3/14;C09K13/04;C23F3/06;H01L21/321 |
主分类号 |
C09K13/00 |
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