发明名称 METHOD OF FABRICATING REFLECTIVE MIRROR BY WET-ETCH USING IMPROVED MASK PATTERN AND REFLECTIVE MIRROR FABRICATED USING THE SAME
摘要 A method is provided of fabricating a reflective mirror having a reflective surface on which light is incident. This method includes: coating at least one of opposite faces of a plate-shaped etchable material made of a single crystal material, with a film-like etching mask; forming a mask pattern on at least one of opposite faces of the etching mask, the mask pattern having a planar shape to which a circle is more similar than a quadrangle; and wet-etching the etchable material. This method allows the reflective mirror to be fabricated so as to have a silhouette of a planar shape to which a circle is more similar than a quadrangle, when viewed in a direction normal to the reflective surface.
申请公布号 US2009223924(A1) 申请公布日期 2009.09.10
申请号 US20060605961 申请日期 2006.11.30
申请人 BROTHER KOGYO KABUSHIKI KAISHA 发明人 ASAI NOBUAKI;MORIOKA EMI
分类号 B29D11/00;B81B3/00;B81C1/00;G02B5/08;G02B26/08;G02B26/10 主分类号 B29D11/00
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