发明名称 |
METHOD OF FABRICATING REFLECTIVE MIRROR BY WET-ETCH USING IMPROVED MASK PATTERN AND REFLECTIVE MIRROR FABRICATED USING THE SAME |
摘要 |
A method is provided of fabricating a reflective mirror having a reflective surface on which light is incident. This method includes: coating at least one of opposite faces of a plate-shaped etchable material made of a single crystal material, with a film-like etching mask; forming a mask pattern on at least one of opposite faces of the etching mask, the mask pattern having a planar shape to which a circle is more similar than a quadrangle; and wet-etching the etchable material. This method allows the reflective mirror to be fabricated so as to have a silhouette of a planar shape to which a circle is more similar than a quadrangle, when viewed in a direction normal to the reflective surface.
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申请公布号 |
US2009223924(A1) |
申请公布日期 |
2009.09.10 |
申请号 |
US20060605961 |
申请日期 |
2006.11.30 |
申请人 |
BROTHER KOGYO KABUSHIKI KAISHA |
发明人 |
ASAI NOBUAKI;MORIOKA EMI |
分类号 |
B29D11/00;B81B3/00;B81C1/00;G02B5/08;G02B26/08;G02B26/10 |
主分类号 |
B29D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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