发明名称 |
Coating compositions for use with an overcoated photoresist |
摘要 |
Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
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申请公布号 |
US7585612(B2) |
申请公布日期 |
2009.09.08 |
申请号 |
US20060481209 |
申请日期 |
2006.07.05 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
THACKERAY JAMES W.;WAYTON GERALD B.;SZMANDA CHARLES R. |
分类号 |
G03C1/825 |
主分类号 |
G03C1/825 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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