| 摘要 |
<p>An inductor element is formed in a wiring layer which is formed in an insulating film on a semiconductor substrate. The inductor element is characterized in that inductor wirings, i.e., surrounding wirings, of the inductor element are formed at different wiring pitches on the cross-sections of at least two wiring layers, an end portion is provided in the surrounding wiring of substantially one lap or two laps on one of two wiring layers, the surrounding wiring is connected, at such end portion, with the end portion of the surrounding wiring on the other wiring layer just above or below through a via, and the surrounding wirings connected through the via have an identical direction of current in respective wiring layers.</p> |
