发明名称 METHOD FOR TREATING A SUBSTRATE
摘要 Disclosed herein is a method for treating a substrate wherein a chemical is fed to a surface of the substrate, the method including the steps of: initially feeding a liquid whose electric conductivity is lower than the chemical to a surface of the substrate so as to wet at least a region where the chemical is to be discharged, and discharging the chemical to the region to treat the surface of the substrate with the discharged chemical.
申请公布号 US2009211610(A1) 申请公布日期 2009.08.27
申请号 US20090368662 申请日期 2009.02.10
申请人 SONY CORPORATION 发明人 HONBE YASUSHI;ABE HITOSHI;IWAMOTO HAYATO
分类号 B08B3/08 主分类号 B08B3/08
代理机构 代理人
主权项
地址