| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology to solve the problem of a film and the like deposited on a substrate holder. SOLUTION: A film-exfoliation preventing chamber 710 in a thin-film manufacturing apparatus is hermetically connected to an unloadlock chamber 2 and a loadlock chamber 1 on a return transfer channel between the unloadlock chamber 2 to retrieve a deposited substrate 9 from the substrate holder 90 and the loadlock chamber 1 to mount an undeposited substrate 9 on the substrate holder 90. In the film-exfoliation chamber 710, a film-coating member is formed for coating the film on the surface of the deposited film in the substrate holder 90 and a holding claw 91. COPYRIGHT: (C)2009,JPO&INPIT |
