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发明名称
METHOD FOR OBTAINING A THIN LAYER HAVING A LOW DENSITY OF HOLES
摘要
申请公布号
EP1831922(B1)
申请公布日期
2009.08.26
申请号
EP20040806549
申请日期
2004.12.28
申请人
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
发明人
BEN MOHAMED, NADIA;NEYRET, ERIC;DELPRAT, DANIEL
分类号
H01L21/762
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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