| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polycondensation compound containing no halogen atom in its backbone, being highly sensitive, not undergoing swelling of a relief pattern due to a developer such as a 2.38% tetramethyl ammonium hydroxide aqueous solution that is generally used in a production process of a semiconductor device, having good solvent resistance of a relief pattern after thermosetting, and being soluble in a γ-butyrolactone solvent before thermosetting. <P>SOLUTION: The polycondensation compound is represented by general formula (1), wherein X<SB>1</SB>, X<SB>2</SB>, and X<SB>3</SB>each denote a divalent organic group containing no halogen atom, may be the same or different, and t and u each independently denote an integer between 1 and 100. <P>COPYRIGHT: (C)2009,JPO&INPIT |
