发明名称 THROUGH SUBSTRATE ANNULAR VIA INCLUDING PLUG FILLER
摘要 A through substrate (10) via includes an annular conductor layer at a periphery of a through substrate (10) aperture, and a plug layer (24) surrounded by the annular conductor layer. A method for fabricating the through substrate (10) via includes forming a blind aperture within a substrate (10) and successively forming and subsequently planarizing within the blind aperture a conformal conductor layer (20) that does not fill the aperture and plug layer (24) that does fill the aperture. The backside of the substrate (10) may then be planarized to expose at least the planarized conformal conductor layer. (20)
申请公布号 CA2708207(A1) 申请公布日期 2009.08.20
申请号 CA20092708207 申请日期 2009.02.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LINDGREN, PETER J.;SPROGIS, EDMUND J.;STAMPER, ANTHONY K.;STEIN, KENNETH J.
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
主权项
地址