| 摘要 |
FIELD: physics. ^ SUBSTANCE: invention concerns a method of effective reception of short-wave, in particular, extreme ultra-violet (EUV) radiation from plasma of pulsing vacuum discharges preferentially with rotating electrodes. The invention can be used for EUV lithography, in particular, at the wave length of =13.5 nanometers corresponding to effective reflexion of mirror Mo/Si of optics. The way of reception of short-wave radiation from plasma of the vacuum discharge consists in an irradiation of one of the electrodes, coated with a plasma-supporting substance using a focused laser beam and realisation of the basic discharge between electrodes by means of the pulsing power supply. The basic discharge is carried out with time delay after laser beam action, and during time delay the auxiliary discharge between electrodes is formed by means of the auxiliary pulsing power supply, and an auxiliary pulsing discharge is carried out using current with direction to an opposite direction of basic discharge current, with energy deposition, smaller in comparison with energy deposition in the basic discharge. ^ EFFECT: magnification of electrical energy transformation efficiency enclosed in the discharge in energy of short-wave radiation, increase of spatial and energy stability of radiating plasma, and also reduction of its effective size. ^ 3 dwg |
