发明名称 AN APPARATUS FOR HANDLING A SUBSTRATE AND A METHOD THEREOF
摘要 An apparatus and method of handling substrates is disclosed. A detecting system, capable of determining whether a substrate is tilted in. relation to the platen, is positioned proximate to the substrate. In some embodiments, the detecting system is a distance measuring system. In other embodiments, it is an angle sensor. The detecting system is in communication with a controller, which, in turn, is in communication with a substrate handling robot. If, based on information received from the detecting system, the controller determines that the substrate is tilted beyond an acceptable range, it is assumed that the substrate has remained attached to the platen. In such a case, the substrate handling robot does not attempt to remove it from the platen. In this way, the substrate is not damaged.
申请公布号 WO2009099922(A2) 申请公布日期 2009.08.13
申请号 WO2009US32556 申请日期 2009.01.30
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;HOLDEN, SCOTT, C. 发明人 HOLDEN, SCOTT, C.
分类号 H01L21/67;H01L21/26;H01L21/68 主分类号 H01L21/67
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