发明名称 VAPOR DEPOSITION FILM FORMATION METHOD
摘要 <p>Disclosed is a vacuum vapor deposition device with excellent series production properties, which simultaneously forms the collector lead formation area and the electrode active material area of a lithium secondary battery. With shutters (12a, 12b) in the closed state, a substrate (4) wound onto a first roll (3) is paid out and transported towards a second roll (8), and stopped upon arriving at first and second vapor deposition zones (60a, 60b). Here, the shutter (12a) is opened and a vapor deposition material in the crucible of a vaporization source (9) is vaporized and delivered to the surface of the substrate (4) positioned at the first vapor deposition zone (60a). Thus, a first vapor deposition film layer is formed on the surface of the substrate (4). After vapor deposition has been performed for a specified time onto the substrate (4), the shutter (12a) is closed. Next, the substrate (4) is transported again and the portion on which vapor deposition was formed in the first vapor deposition zone (60a) is stopped at the position of the second vapor deposition zone (60b). The shutters (12a, 12b) are opened and vapor deposition is performed again, forming a first layer in the first vapor deposition zone (60a) and forming a second vapor deposition film layer with a different growth orientation than that of the first layer on top of the first layer in the second vapor deposition zone (60b).</p>
申请公布号 WO2009098893(A1) 申请公布日期 2009.08.13
申请号 WO2009JP00467 申请日期 2009.02.06
申请人 PANASONIC CORPORATION;OKAZAKI, SADAYUKI;HONDA, KAZUYOSHI 发明人 OKAZAKI, SADAYUKI;HONDA, KAZUYOSHI
分类号 C23C14/24;C23C14/56;H01M4/50 主分类号 C23C14/24
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