发明名称 LIQUID PROCESSING DEVICE AND LIQUID PROCESSING METHOD
摘要 <p>A liquid processing device has a first supply source (52) for supplying a first processing fluid, and a second supply source (53) for supplying a second processing fluid. A discharge opening (27) for supplying a mixed fluid produced at a mixing section (26) is connected to first processing fluid supply paths (62u, 62l) and to a second processing fluid supply path (63). A flow rate regulation valve (10) is provided on the downstream of an on/off valve (20) provided in the first processing fluid supply path (62u). The flow rate regulation valve (10) is connected to a valve driving fluid supply section (51), and the on/off speed is regulated by cooperation between the valve driving fluid and the first processing fluid.</p>
申请公布号 WO2009098969(A1) 申请公布日期 2009.08.13
申请号 WO2009JP51246 申请日期 2009.01.27
申请人 TOKYO ELECTRON LIMITED;CHOUNO, YASUHIRO 发明人 CHOUNO, YASUHIRO
分类号 B08B3/04;H01L21/304 主分类号 B08B3/04
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